CHEMICAL CLEANING ACTIVATED CARBON FILTER

Organics and Chlorine Removal in Cleaning Cycles

ERGIL manufactures chemical cleaning activated carbon filters removing organic contaminants and chlorine from cleaning solutions and rinse water. These vessels polish chemical cleaning circuits enabling solution reuse and protecting equipment in semiconductor, pharmaceutical, and industrial applications.

Cleaning Circuit Purpose

Chemical cleaning removes organic fouling, biofilms, and scale from process equipment. Cleaning solutions accumulate dissolved organics and chlorine oxidants. Carbon filtration purifies cleaning chemicals enabling multiple reuse cycles reducing costs and disposal.

Vessel Design

Vertical pressure vessel with cleaning solution inlet, activated carbon bed 30-48 inches depth, support gravel layers, underdrain system collecting filtered solution, outlet returning to cleaning circuit. Empty bed contact time 8-15 minutes.

Carbon Media

Granular activated carbon high iodine number for organics adsorption. Particle size 8x30 or 12x40 mesh. Materials withstand cleaning chemical exposure - acids, caustics, oxidizers. Carbon life 6-18 months depending on organic loading.

Operating Pressure

Typical 50-100 psig in cleaning systems. Clean bed pressure drop 8-12 psi. Carbon exhaustion indicated by breakthrough of organics or chlorine not pressure increase.

Chlorine Removal

Dechlorination protects sensitive membranes and equipment from oxidant damage. Carbon removes chlorine and chloramines to under 0.1 ppm. Essential when cleaning circuits recirculate to process systems.

Organic Adsorption

Removes dissolved organics, surfactants, detergent residues, oils, and biological material from cleaning solutions. Reduces total organic carbon maintaining cleaning effectiveness. Prevents organic buildup degrading solution performance.

Material Selection

Stainless steel 316L for chemical cleaning environments. Alloy options for aggressive chemicals. Internal components resist acids, caustics, and oxidizers. Materials prevent contamination of ultrapure cleaning solutions.

Backwash Requirements

Periodic backwash removes particulates and redistributes carbon bed. Flow rate 8-10 gpm per square foot. Backwash medium compatible with cleaning chemicals. Frequency depends on particulate loading.

Applications

Semiconductor CIP (clean-in-place) systems, pharmaceutical equipment cleaning, membrane cleaning circuits, heat exchanger cleaning, and any application requiring purified chemical cleaning solutions for reuse.

Breakthrough Monitoring

Chlorine analyzers detect dechlorination exhaustion. TOC or conductivity measurements track organic removal. Breakthrough signals carbon replacement or regeneration requirement preventing poor cleaning performance.

Solution Recovery

Filtered cleaning solution reuses multiple times reducing fresh chemical consumption. Recovery extends cleaning cycles lowering costs. Environmental benefits from reduced disposal volumes.

Temperature Considerations

Cleaning solutions often elevated temperature 40-80C. Carbon capacity reduces at higher temperatures. Material selection and design account for thermal conditions.

Regeneration Options

Small systems replace spent carbon. Large installations may regenerate off-site restoring capacity. Economic decision based on carbon volume and contamination level.

Performance Benefits

Enables chemical cleaning solution reuse reducing costs. Removes chlorine protecting equipment. Simple proven carbon adsorption technology. Extends cleaning cycle effectiveness.

Construction Standards

Pressure vessels per ASME Section VIII. Materials for chemical cleaning service. Design accommodates carbon weight and chemical exposure. Complete documentation with contact time calculations and compatibility data.

ERGIL chemical cleaning activated carbon filters provide organics and chlorine removal enabling cleaning solution reuse in semiconductor, pharmaceutical, and industrial cleaning applications.

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